Invention Grant
US07804646B2 Method for decomposition of a customized DOE for use with a single exposure into a set of multiple exposures using standard DOEs with optimized exposure settings
有权
用于使用具有优化曝光设置的标准DOE将单次曝光用于多次曝光的定制DOE的分解方法
- Patent Title: Method for decomposition of a customized DOE for use with a single exposure into a set of multiple exposures using standard DOEs with optimized exposure settings
- Patent Title (中): 用于使用具有优化曝光设置的标准DOE将单次曝光用于多次曝光的定制DOE的分解方法
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Application No.: US11700231Application Date: 2007-01-31
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Publication No.: US07804646B2Publication Date: 2010-09-28
- Inventor: Ting Chen , Jang Fung Chen
- Applicant: Ting Chen , Jang Fung Chen
- Applicant Address: NL
- Assignee: ASML Masktools B.V.
- Current Assignee: ASML Masktools B.V.
- Current Assignee Address: NL
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G02B5/18
- IPC: G02B5/18 ; G02B27/42
Abstract:
A method of determining diffractive optical elements to be utilized in an imaging process. The method includes the steps of defining a customized diffractive optical element which is based on a target pattern to be printed during the imaging process; decomposing the customized diffractive optical element into one or more standard diffractive optical elements; and defining an exposure dose to be assigned to each of the one or more standard diffractive optical elements.
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