Invention Grant
US07804869B2 Gallium nitride based semiconductor device with electron blocking layer 有权
具有电子阻挡层的氮化镓基半导体器件

Gallium nitride based semiconductor device with electron blocking layer
Abstract:
A semiconductor device comprises an n-side waveguide layer, an active layer in contact with the n-side waveguide layer and a p-side waveguide layer in contact with the active layer. An electron blocking layer is in contact with the p-side waveguide layer and comprises a first composition of two elements from group III of the periodic table and an element from group V of the periodic table. A cladding layer includes a cladding sublayer that is in contact with the electron blocking layer. The cladding sublayer comprises a second composition of two elements from group III of the periodic table and an element from group V of the periodic table. The second composition is different from the first composition.
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