Invention Grant
- Patent Title: Method and device for analyzing a technical process
- Patent Title (中): 用于分析技术过程的方法和装置
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Application No.: US11665505Application Date: 2005-10-07
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Publication No.: US07805280B2Publication Date: 2010-09-28
- Inventor: Rupert Maier , Ralf Sykosch
- Applicant: Rupert Maier , Ralf Sykosch
- Applicant Address: DE Munich
- Assignee: Siemens Aktiengesellschaft
- Current Assignee: Siemens Aktiengesellschaft
- Current Assignee Address: DE Munich
- Priority: DE102004050386 20041015
- International Application: PCT/EP2005/055110 WO 20051007
- International Announcement: WO2006/042799 WO 20060427
- Main IPC: G06F17/40
- IPC: G06F17/40

Abstract:
A method for analyzing technical processes is disclosed, which is characterized in that measuring data of the technical process is generated by at least one decentralized measuring unit, image data associated with a mechanical course of the technical process is produced by at least one decentralized image detection unit, the measuring data stored in the at least one decentralized measuring unit and the image data stored in the at least one image detection unit is provided with a time stamp available to all systems, the measuring and image data are transmitted to a central detection unit where said data is displayed and/or processed in a time-synchronous manner using the time stamp function. Since time stamping is carried out directly in situ, i.e. decentrally in the respective measuring and image detection units, data transmission time required to transmit data to the central detection unit is not critical, so that a time-synchronized display and/or further processing of the measuring and image data can be carried out in the central detection unit with a high degree of accuracy.
Public/Granted literature
- US20080154545A1 Method and Device For Analyzing a Technical Process Public/Granted day:2008-06-26
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