Invention Grant
- Patent Title: Physical-resist model using fast sweeping
- Patent Title (中): 使用快速扫描的物理抗蚀剂模型
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Application No.: US11773923Application Date: 2007-07-05
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Publication No.: US07805700B2Publication Date: 2010-09-28
- Inventor: Danping Peng
- Applicant: Danping Peng
- Applicant Address: US CA Palo Alto
- Assignee: Luminescent Technologies, Inc.
- Current Assignee: Luminescent Technologies, Inc.
- Current Assignee Address: US CA Palo Alto
- Agency: Wilson Sonsini Goodrich & Rosati
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A method for determining a surface in a material is described. During this method, arrival times of a wavefront at a first depth in the material are calculated using an Eikonal equation. Note that the first depth is proximate to an outer surface of the material. Next, arrival times of the wavefront at a second depth in the material are calculated using the Eikonal equation and the calculated arrival times at the first depth. Then, the surface in the material is determined based on the calculated arrival times at the first depth, the calculated arrival times at the second depth, and a given time interval. Note that arrival times at a given depth in the material, which includes the first depth or the second depth, are calculated by directly determining a steady-state solution of the Eikonal equation.
Public/Granted literature
- US20090013304A1 Physical-Resist Model Using Fast Sweeping Public/Granted day:2009-01-08
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