Invention Grant
- Patent Title: Substrate cleaning apparatus and substrate cleaning method using the same
- Patent Title (中): 基板清洗装置及使用其的基板清洗方法
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Application No.: US11898236Application Date: 2007-09-11
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Publication No.: US07806986B2Publication Date: 2010-10-05
- Inventor: Sinji Ueebisu
- Applicant: Sinji Ueebisu
- Applicant Address: JP Kanagawa
- Assignee: NEC LCD Technologies, Ltd.
- Current Assignee: NEC LCD Technologies, Ltd.
- Current Assignee Address: JP Kanagawa
- Agency: Young & Thompson
- Priority: JP2006-250475 20060915
- Main IPC: B08B3/00
- IPC: B08B3/00 ; B08B3/02 ; B08B3/04 ; B08B11/02 ; B08B1/02 ; B08B1/04

Abstract:
Disclosed is a substrate cleaning apparatus including a brush cleaning unit which cleans a substrate by making a roll brush in contact with a surface of the substrate, and a transporting unit which conveys the substrate. The roll brush includes a bristle. At least one of a diameter of the roll brush, stiffness of the bristle, and density of the bristle becomes larger from an end portion of the roll brush to a central portion thereof.
Public/Granted literature
- US20080066780A1 Substrate cleaning apparatus and substrate cleaning method using the same Public/Granted day:2008-03-20
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