Invention Grant
- Patent Title: Radial antenna and plasma processing apparatus comprising the same
- Patent Title (中): 径向天线及其等离子体处理装置
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Application No.: US10343201Application Date: 2001-08-02
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Publication No.: US07807019B2Publication Date: 2010-10-05
- Inventor: Nobuo Ishii
- Applicant: Nobuo Ishii
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2000-234497 20000802
- International Application: PCT/JP01/06658 WO 20010802
- International Announcement: WO02/13249 WO 20020214
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/306

Abstract:
Guide members (37) extending from the microwave entrance to a ring member (34) are arranged in the direction of propagation of microwave in a radial waveguide. The guide members (37) contribute to prevention of complex electromagnetic mode due to a microwave reflected from the peripheral portion of the radial waveguide. Therefore, a uniform plasma can be produced because the radiation into the process chamber is uniform even not by disposing any electromagnetic absorbing member at the peripheral portion of the radial waveguide. Since the microwave reflected from the peripheral portion of the radial waveguide can be used to produce a plasma if any electromagnetic absorbing member is not disposed, the plasma can be produced efficiently, and excessive heat is not generated.
Public/Granted literature
- US20040027302A1 Radial antenna and plasma processing apparatus comprising the same Public/Granted day:2004-02-12
Information query
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