Invention Grant
- Patent Title: Method of forming orifice plate for fluid ejection device
- Patent Title (中): 形成流体喷射装置孔板的方法
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Application No.: US11030036Application Date: 2005-01-05
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Publication No.: US07807079B2Publication Date: 2010-10-05
- Inventor: John Rausch , Kevin Brown , Rio Rivas
- Applicant: John Rausch , Kevin Brown , Rio Rivas
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Main IPC: B29C41/20
- IPC: B29C41/20 ; B29C41/22

Abstract:
A method of forming an orifice plate for a fluid ejection device includes depositing and patterning a mask material on a conductive surface, forming a first layer on the conductive surface, forming a second layer on the first layer, and removing the first layer and the second layer from the conductive surface, wherein the first layer includes a metallic material and the second layer includes a polymer material.
Public/Granted literature
- US20050110188A1 Orifice plate and method of forming orifice plate for fluid ejection device Public/Granted day:2005-05-26
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