Invention Grant
- Patent Title: Diamond single crystal substrate
- Patent Title (中): 金刚石单晶基板
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Application No.: US12364609Application Date: 2009-02-03
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Publication No.: US07807126B2Publication Date: 2010-10-05
- Inventor: Kiichi Meguro , Yoshiyuki Yamamoto , Takahiro Imai
- Applicant: Kiichi Meguro , Yoshiyuki Yamamoto , Takahiro Imai
- Applicant Address: JP Osaka
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2005-091061 20050328; JP2006-010596 20060119
- Main IPC: C30B23/00
- IPC: C30B23/00 ; C30B25/00 ; C30B28/12 ; C30B28/14 ; B01J3/06 ; B01J3/08 ; C01B31/06

Abstract:
A method for manufacturing a diamond single crystal substrate, in which a single crystal is grown from a diamond single crystal serving as a seed substrate by vapor phase synthesis, said method comprising: preparing a diamond single crystal seed substrate which has a main surface whose planar orientation falls within an inclination range of not more than 8 degrees relative to a {100} plane or a {111} plane, as a seed substrate; forming a plurality of planes of different orientation which are inclined in the outer peripheral direction of the main surface relative to the main surface on one side of this seed substrate, by machining; and then growing a diamond single crystal by vapor phase synthesis.
Public/Granted literature
- US20090142249A1 DIAMOND SINGLE CRYSTAL SUBSTRATE Public/Granted day:2009-06-04
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