Invention Grant
- Patent Title: Reflective photomask and method of fabricating the same
- Patent Title (中): 反光光掩模及其制造方法
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Application No.: US11656466Application Date: 2007-01-23
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Publication No.: US07807318B2Publication Date: 2010-10-05
- Inventor: Jin-Hong Park , Han-Ku Cho , Seong-Sue Kim , Sang-Gyun Woo , Suk-Joo Lee
- Applicant: Jin-Hong Park , Han-Ku Cho , Seong-Sue Kim , Sang-Gyun Woo , Suk-Joo Lee
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2006-0010196 20060202
- Main IPC: G03F1/00
- IPC: G03F1/00
Abstract:
A reflective photomask for EUV light is disclosed. The reflective photomask may include a projecting pattern selectively formed on a substrate and a reflective layer on the substrate and the projecting pattern.
Public/Granted literature
- US20070178393A1 Reflective photomask and method of fabricating the same Public/Granted day:2007-08-02
Information query
