Invention Grant
- Patent Title: Photosensitive composition and pattern-forming method using the same
- Patent Title (中): 光敏组合物和使用其的图案形成方法
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Application No.: US11373188Application Date: 2006-03-13
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Publication No.: US07807329B2Publication Date: 2010-10-05
- Inventor: Kazuyoshi Mizutani , Yasutomo Kawanishi
- Applicant: Kazuyoshi Mizutani , Yasutomo Kawanishi
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JPP.2005-075494 20050316
- Main IPC: G03F7/029
- IPC: G03F7/029
Abstract:
A photosensitive composition comprises (A) a specific compound, which is excellent in sensitivity, resolution, and defocus latitude (DOF), and a pattern-forming method using the photosensitive composition is provided.
Public/Granted literature
- US20060210919A1 Photosensitive composition and pattern-forming method using the same Public/Granted day:2006-09-21
Information query
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