Invention Grant
- Patent Title: Method for doping impurities
- Patent Title (中): 掺杂杂质的方法
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Application No.: US11566814Application Date: 2006-12-05
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Publication No.: US07807556B2Publication Date: 2010-10-05
- Inventor: Greg Thomas Dunne , Jesse Berkley Tucker , Stanislav Ivanovich Soloviev , Zachary Matthew Stum
- Applicant: Greg Thomas Dunne , Jesse Berkley Tucker , Stanislav Ivanovich Soloviev , Zachary Matthew Stum
- Applicant Address: US NY Niskayuna
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Niskayuna
- Agent Ann M. Agosti
- Main IPC: H01L21/22
- IPC: H01L21/22 ; H01L21/38
Abstract:
A method for doping impurities into a device layer includes providing a carbonized dopant layer including one or more dopant impurities over a device layer and heat treating the carbonized dopant layer to thermally diffuse the dopant impurities into the device layer.
Public/Granted literature
- US20080132047A1 METHOD FOR DOPING IMPURITIES Public/Granted day:2008-06-05
Information query
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