Invention Grant
US07807741B2 Coating liquid, film production method, production method of functional device, and functional device
有权
涂布液,薄膜制造方法,功能元件的制造方法以及功能元件
- Patent Title: Coating liquid, film production method, production method of functional device, and functional device
- Patent Title (中): 涂布液,薄膜制造方法,功能元件的制造方法以及功能元件
-
Application No.: US11570260Application Date: 2005-06-13
-
Publication No.: US07807741B2Publication Date: 2010-10-05
- Inventor: Emi Yamamoto
- Applicant: Emi Yamamoto
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Keating & Bennett, LLP
- Priority: JP2004-179773 20040617
- International Application: PCT/JP2005/010805 WO 20050613
- International Announcement: WO2005/123856 WO 20051229
- Main IPC: C08K5/375
- IPC: C08K5/375 ; C08K5/06 ; C08K5/07

Abstract:
The present invention provides a coating liquid which is excellent in stabilities and capable of being stably ejected by an ejection equipment and suppressing variation in film thickness inside a film or between films, in application for various uses, a film production method, a production method of a functional device, and a functional device, using the coating liquid. The present invention is a coating liquid comprising a mixed solvent and a functional material, wherein the mixed solvent comprises a first solvent constituted by a compound having two or more aromatic rings such as diphenyl sulfide, diphenylmethane, diphenyl ether, and a symmetric structure and another solvent constituted by a compound having an aromatic ring such as xylene, and a proportion by volume of the another solvent is 90% or less in the mixed solvent.
Public/Granted literature
- US20080038488A1 Coating Liquid, Film Production Method, Production Method of Functional Device, and Functional Device Public/Granted day:2008-02-14
Information query