Invention Grant
US07807944B2 Laser processing device, processing method, and method of producing circuit substrate using the method
失效
激光加工装置,加工方法和使用该方法生产电路基板的方法
- Patent Title: Laser processing device, processing method, and method of producing circuit substrate using the method
- Patent Title (中): 激光加工装置,加工方法和使用该方法生产电路基板的方法
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Application No.: US10523392Application Date: 2003-08-07
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Publication No.: US07807944B2Publication Date: 2010-10-05
- Inventor: Akira Akasaka , Toshifumi Ito , Kikuo Takahashi
- Applicant: Akira Akasaka , Toshifumi Ito , Kikuo Takahashi
- Applicant Address: JP Tokyo
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2002-232609 20020809
- International Application: PCT/JP03/10052 WO 20030807
- International Announcement: WO2004/014595 WO 20040219
- Main IPC: B23K26/00
- IPC: B23K26/00

Abstract:
A laser processing apparatus for performing processing such as perforation on a ceramic green sheet etc. using a laser beam efficiently. The laser processing apparatus is provided with a plurality of optical path systems disposed between a laser oscillator and an irradiation position control optical system for irradiating a predetermined position on a work piece with a laser beam. The plurality of optical path systems includes an optical path system that guides the laser beam to the irradiation position control optical system without changing its cross sectional shape in the direction perpendicular to the optical axis of the laser beam and an optical path system that guides the laser beam while changing its cross sectional shape so that these optical path systems are selectively used in accordance with the processing condition.
Public/Granted literature
- US20050232316A1 Laser processing device, processing method, and method of producing circuit substrate using the method Public/Granted day:2005-10-20
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