Invention Grant
- Patent Title: Evaluation pattern suitable for evaluation of lateral hillock formation
- Patent Title (中): 评估模式适用于评估外侧小丘形成
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Application No.: US12232486Application Date: 2008-09-18
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Publication No.: US07807998B2Publication Date: 2010-10-05
- Inventor: Takayuki Watanabe
- Applicant: Takayuki Watanabe
- Applicant Address: JP Kawasaki, Kanagawa
- Assignee: NEC Electronics Corporation
- Current Assignee: NEC Electronics Corporation
- Current Assignee Address: JP Kawasaki, Kanagawa
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2007-249246 20070926
- Main IPC: H01L23/58
- IPC: H01L23/58 ; H01L23/52 ; G01R31/02

Abstract:
An evaluation pattern for evaluation of lateral hillock formation is provided with a lattice pattern; and an isolated metallization. The lattice pattern includes: a loop interconnection; and lattice interconnections laterally and vertically arranged to intersect with one another so that a region surrounded by the loop interconnection is divided into a plurality of sub-regions arranged in rows and columns. The width of the lattice interconnections is narrower than the width of the loop interconnection. The isolated metallization is provided in an outmost one of the sub-regions, the outmost one being surrounded by the loop interconnection and corresponding ones of the lattice interconnections.
Public/Granted literature
- US20090079459A1 Evaluation pattern suitable for evaluation of lateral hillock formation Public/Granted day:2009-03-26
Information query
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