Invention Grant
US07808266B2 Method and apparatus for evaluating the effects of stress on an RF oscillator
有权
用于评估应力对RF振荡器的影响的方法和装置
- Patent Title: Method and apparatus for evaluating the effects of stress on an RF oscillator
- Patent Title (中): 用于评估应力对RF振荡器的影响的方法和装置
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Application No.: US12352795Application Date: 2009-01-13
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Publication No.: US07808266B2Publication Date: 2010-10-05
- Inventor: Andrew Marsall , Srikanth Krishnan
- Applicant: Andrew Marsall , Srikanth Krishnan
- Applicant Address: US TX Dallas
- Assignee: Texas Instruments Incorporated
- Current Assignee: Texas Instruments Incorporated
- Current Assignee Address: US TX Dallas
- Agent Jacqueline J. Garner; Wade J. Brady, III; Frederick J. Telecky, Jr.
- Main IPC: G01R31/26
- IPC: G01R31/26

Abstract:
Apparatus and methods are disclosed for evaluating degradation of a transistor in a cross coupled pair of an RF oscillator independently. A MOS device can be coupled between a separated center-tap inductor. By appropriately sizing the MOS device and turning the MOS device on during operation of RF oscillator, a good contact can again be made that allows the oscillator to operate at design performance. By turning the MOS device off, the supplies can be separates such that I-V characteristics of both transistors of the cross-coupled pair may be obtained.
Public/Granted literature
- US20100164533A1 METHOD AND APPARATUS FOR EVALUATING THE EFFECTS OF STRESS ON AN RF OSCILLATOR Public/Granted day:2010-07-01
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