Invention Grant
US07808611B2 Lithographic apparatus and device manufacturing method using acidic liquid
有权
使用酸性液体的平版印刷设备和器件制造方法
- Patent Title: Lithographic apparatus and device manufacturing method using acidic liquid
- Patent Title (中): 使用酸性液体的平版印刷设备和器件制造方法
-
Application No.: US11355192Application Date: 2006-02-16
-
Publication No.: US07808611B2Publication Date: 2010-10-05
- Inventor: Bob Streefkerk , Marcel Mathijs Theodore Marie Dierichs , Wendy Fransisca Johanna Gehoel-Van Ansem
- Applicant: Bob Streefkerk , Marcel Mathijs Theodore Marie Dierichs , Wendy Fransisca Johanna Gehoel-Van Ansem
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP03253420 20030530
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42
Abstract:
A lithographic apparatus and device manufacturing method is provided in which exposure is carried out by projecting through a liquid having a pH of less than 7, the liquid being in contact with a substrate to be exposed. The liquid advantageously comprises an anti-reflective topcoat.
Public/Granted literature
- US20070046915A1 Lithographic apparatus and device manufacturing method Public/Granted day:2007-03-01
Information query
