Invention Grant
- Patent Title: Lithographic apparatus and method for masking a substrate
- Patent Title (中): 用于掩蔽衬底的平版印刷设备和方法
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Application No.: US11783113Application Date: 2007-04-05
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Publication No.: US07808612B2Publication Date: 2010-10-05
- Inventor: Remko Wakker , Erik Marie Jose Smeets
- Applicant: Remko Wakker , Erik Marie Jose Smeets
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52
Abstract:
A method of removing a substrate from a substrate table of a lithographic apparatus. The substrate table is provided with a mask arranged to form a peripheral exposure exclusion region on a substrate. The method includes moving the mask from an in use position to a storage position. The storage position is adjacent to a projection system of the lithographic apparatus. The method also includes removing the substrate from the lithographic apparatus.
Public/Granted literature
- US20080246935A1 Lithographic apparatus and method for masking a substrate Public/Granted day:2008-10-09
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