Invention Grant
- Patent Title: Magnetoresistance effect element, substrate therefor and manufacturing method thereof
- Patent Title (中): 磁阻效应元件及其制造方法
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Application No.: US11713050Application Date: 2007-03-02
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Publication No.: US07808749B2Publication Date: 2010-10-05
- Inventor: Futoyoshi Kou
- Applicant: Futoyoshi Kou
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Dickstein Shapiro LLP
- Priority: JP2006-057986 20060303; JP2006-058012 20060303
- Main IPC: G11B5/127
- IPC: G11B5/127

Abstract:
A magnetoresistance effect element which is used in a magnetic sensor is disclosed. The magnetoresistance effect element includes a soft layer whose magnetization easy direction is changed by a direction of an external magnetic field, and a magnetization fixing layer whose magnetization direction is fixed by having a magnetic layer and an anti-ferromagnetic layer. A magnetoresistance effect is generated by a change of electric conduction which is caused by a relative angle between the magnetization easy direction of the soft layer and the magnetization direction of the magnetization fixing layer. When the magnetic sensor includes two or more magnetoresistance effect elements for having two-axis or more vectors of the magnetization directions, the two or more magnetoresistance effect elements are adjacently disposed.
Public/Granted literature
- US20070205766A1 Magnetoresistance effect element, substrate therefor and manufacturing method thereof Public/Granted day:2007-09-06
Information query
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