Invention Grant
- Patent Title: Protection gas control method for non-sealed process chamber
- Patent Title (中): 非密封处理室保护气体控制方法
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Application No.: US12165792Application Date: 2008-07-01
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Publication No.: US07809474B2Publication Date: 2010-10-05
- Inventor: Chun-Hung Huang , Ming-Lang Chang , Yen-Chia Peng , Tsang-Fang Jeng , Tzu-Hsin Kuo
- Applicant: Chun-Hung Huang , Ming-Lang Chang , Yen-Chia Peng , Tsang-Fang Jeng , Tzu-Hsin Kuo
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, PC
- Agent Justin King
- Priority: TW97101438A 20080115
- Main IPC: G05D7/00
- IPC: G05D7/00 ; G06F19/00

Abstract:
A protection gas control method for a non-sealed process chamber including the steps of activating a protection gas control apparatus while coupling a protection gas to a plurality of throttle valves, opening all the throttle valves for a pre-determined period of time, closing at least one of the throttle valves if the oxygen concentration in the chamber is smaller than or equal to a first target value, determining whether the oxygen concentration in the chamber is smaller than or equal to a second target value, and stopping supplying the protection gas when the temperature of the chamber is lower than a pre-determined temperature.
Public/Granted literature
- US20090182457A1 PROTECTION GAS CONTROL METHOD AND APPARATUS FOR NON-SEALED PROCESS CHAMBER Public/Granted day:2009-07-16
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