Invention Grant
US07811428B2 Method and apparatus for an improved optical window deposition shield in a plasma processing system
有权
用于等离子体处理系统中改进的光学窗口沉积屏蔽的方法和装置
- Patent Title: Method and apparatus for an improved optical window deposition shield in a plasma processing system
- Patent Title (中): 用于等离子体处理系统中改进的光学窗口沉积屏蔽的方法和装置
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Application No.: US11620289Application Date: 2007-01-05
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Publication No.: US07811428B2Publication Date: 2010-10-12
- Inventor: Shinya Nishimoto , Kouji Mitsuhashi , Hidehito Saigusa , Taira Takase , Hiroyuki Nakayama
- Applicant: Shinya Nishimoto , Kouji Mitsuhashi , Hidehito Saigusa , Taira Takase , Hiroyuki Nakayama
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: C23C14/34
- IPC: C23C14/34 ; C23C16/00
Abstract:
The present invention presents an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.
Public/Granted literature
- US20070102287A1 METHOD AND APPARATUS FOR AN IMPROVED OPTICAL WINDOW DEPOSITION SHIELD IN A PLASMA PROCESSING SYSTEM Public/Granted day:2007-05-10
Information query
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