Invention Grant
- Patent Title: Manufacturing method of display device
- Patent Title (中): 显示装置的制造方法
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Application No.: US12043159Application Date: 2008-03-06
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Publication No.: US07811910B2Publication Date: 2010-10-12
- Inventor: Mikio Hongo , Akio Yazaki , Takahiro Kamo
- Applicant: Mikio Hongo , Akio Yazaki , Takahiro Kamo
- Applicant Address: JP Chiba
- Assignee: Hitachi Displays, Ltd.
- Current Assignee: Hitachi Displays, Ltd.
- Current Assignee Address: JP Chiba
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2007-056826 20070307
- Main IPC: H01L21/268
- IPC: H01L21/268

Abstract:
In crystallization of a silicon film by annealing using a linear-shaped laser beam having a width of the short axis of the beam is ununiform, the profile (intensity distribution) of the laser beam is evaluated and the results are fed back to a condition of oscillating the laser beam or an optical condition for projecting the laser beam onto the silicon film, whereby a display device comprising a high-quality crystalline silicon film is manufactured. The energy distribution of the linear-shaped laser beam is determined by a detector type CCD camera which is moved stepwise in the directions in which its long axis and short axis extend, respectively, and a value obtained by dividing an accumulated intensity E in the long axis direction obtained by accumulating the detected signal in the direction parallel to the short axis by the square root of the width W of the short axis of the above linear-shaped laser beam in each position of the long axis: E/√{square root over ( )}(W), is determined in all the positions of a cross section of the linear-shaped laser beam to evaluate the above intensity distribution.
Public/Granted literature
- US20080227274A1 MANUFACTURING METHOD OF DISPLAY DEVICE Public/Granted day:2008-09-18
Information query
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