Invention Grant
US07811944B2 Semiconductor device and a method of manufacture therefor 有权
半导体装置及其制造方法

Semiconductor device and a method of manufacture therefor
Abstract:
The present invention provides a semiconductor device, a method of manufacture therefor, and an integrated circuit including the aforementioned semiconductor device. The semiconductor device, in accordance with the principles of the present invention, may include a substrate, and a graded capping layer located over the substrate, wherein the graded capping layer includes at least two different layers, wherein first and second layers of the at least two different layers have different stress values.
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