Invention Grant
- Patent Title: Method of polishing tape-shaped substrate and substrate for oxide superconductor
- Patent Title (中): 抛光带状基板和氧化物超导体基板的方法
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Application No.: US12194346Application Date: 2008-08-19
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Publication No.: US07811972B2Publication Date: 2010-10-12
- Inventor: Yuji Horie , Noriyuki Kumasaka , Sanaki Horimoto
- Applicant: Yuji Horie , Noriyuki Kumasaka , Sanaki Horimoto
- Applicant Address: JP Tokyo
- Assignee: NIHON Micro Coating Co., Ltd.
- Current Assignee: NIHON Micro Coating Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Weaver Austin Villeneuve & Sampson LLP
- Priority: JP2007-219072 20070824
- Main IPC: H01L39/24
- IPC: H01L39/24 ; H01L39/12

Abstract:
A target surface of a tape-shaped substrate of an oxide superconductor with an intermediate layer formed on this target surface and an oxide superconductor thin film is polished by causing the tape-shaped substrate to continuously run. The polishing step includes an initial polishing process for carrying out random polishing of the target surface and a finishing process that is carried out after the initial polishing process for forming grooves on the target surface along the running direction of the substrate. The intermediate layer has an in-plane directionality of 7° or less. The tape-shaped substrate is fabricated by rolling nickel, a nickel alloys or stainless steel.
Public/Granted literature
- US20090054243A1 METHOD OF POLISHING TAPE-SHAPED SUBSTRATE AND SUBSTRATE FOR OXIDE SUPERCONDUCTOR Public/Granted day:2009-02-26
Information query
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