Invention Grant
US07812464B2 Semiconductor device and a method of manufacturing for high output MOSFET
失效
半导体器件和高输出MOSFET的制造方法
- Patent Title: Semiconductor device and a method of manufacturing for high output MOSFET
- Patent Title (中): 半导体器件和高输出MOSFET的制造方法
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Application No.: US12149183Application Date: 2008-04-29
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Publication No.: US07812464B2Publication Date: 2010-10-12
- Inventor: Toshinori Hirashima , Munehisa Kishimoto , Toshiyuki Hata , Yasushi Takahashi
- Applicant: Toshinori Hirashima , Munehisa Kishimoto , Toshiyuki Hata , Yasushi Takahashi
- Applicant Address: JP Kawasaki
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kawasaki
- Agency: Mattingly & Malur, P.C.
- Priority: JP11-038124 19990217; JP11-372510 19991228
- Main IPC: H01L23/28
- IPC: H01L23/28 ; H01L27/088

Abstract:
A semiconductor device and method having high output and having reduced external resistance is reduced and improved radiating performance. A MOSFET (70) has a connecting portion for electrically connecting a surface electrode of a semiconductor pellet and a plurality of inner leads, a resin encapsulant (29), a plurality of outer leads (37), (38) protruding in parallel from the same lateral surface of the resin encapsulant (29) and a header (28) bonded to a back surface of the semiconductor pellet and having a header protruding portion (28c) protruding from a lateral surface of the resin encapsulant (29) opposite to the lateral surface from which the outer leads protrude, wherein the header (28) has an exposed surface (28b) exposed from the resin encapsulant (29); the outer leads (37), (38) are bent; and the exposed of the outer leads (37), (38) are provided at substantially the same height.
Public/Granted literature
- US20080211082A1 Semiconductor device and a method of manufacturing the same Public/Granted day:2008-09-04
Information query
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