Invention Grant
- Patent Title: Sample analysis apparatus and analysis method
- Patent Title (中): 样品分析仪器及分析方法
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Application No.: US11194694Application Date: 2005-08-02
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Publication No.: US07812955B2Publication Date: 2010-10-12
- Inventor: Toshihito Kimura
- Applicant: Toshihito Kimura
- Applicant Address: JP
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP
- Agency: Sughrue Mion, PLLC
- Priority: JP2004-225522 20040802
- Main IPC: G01N21/55
- IPC: G01N21/55

Abstract:
A light beam irradiating optical system is associated with a dielectric material member having a surface, on which a thin film layer has been formed, a sample being brought into contact with a surface of the thin film layer. The light beam irradiating optical system produces and irradiates a light beam to an interface between the dielectric material member and the thin film layer. The light beam is constituted of light beam components, which have various different incidence angles with respect to the interface, and which have intensities varying in accordance with the incidence angles. A single measuring detector for outputting a signal representing an intensity of an entire area of received light is secured and located so as to receive the light beam having been reflected from the interface.
Public/Granted literature
- US20060023221A1 Sample analysis apparatus and analysis method Public/Granted day:2006-02-02
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