Invention Grant
- Patent Title: Microscopy method and microscope
- Patent Title (中): 显微镜法和显微镜
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Application No.: US11847943Application Date: 2007-08-30
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Publication No.: US07812967B2Publication Date: 2010-10-12
- Inventor: Yoshinori Iketaki
- Applicant: Yoshinori Iketaki
- Applicant Address: JP Tokyo
- Assignee: Olympus Corporation
- Current Assignee: Olympus Corporation
- Current Assignee Address: JP Tokyo
- Agency: Holtz, Holtz, Goodman & Chick, PC
- Priority: JP2006-349694 20061226
- Main IPC: G01N21/41
- IPC: G01N21/41

Abstract:
The present invention provides a microscopy method and a microscope, which enable microscopic observation of desired information of a specimen with an extremely high S/N ratio in a short period of time without increasing intensity of a light sources. The method of the invention is characterized in that it comprises: a simultaneous irradiation step of irradiating a specimen with first and second electromagnetic rays having different wave length with the rays overlapping at least partly each other; and a simultaneous irradiation visualization step of visualizing a spatial distribution of a refractive index variation caused by the irradiation of the first electromagnetic ray as a phase contrast image of the second electromagnetic ray having passed through the specimen in the region of the specimen to which the overlapped the first and the second electromagnetic rays are irradiated.
Public/Granted literature
- US20080151239A1 MICROSCOPY METHOD AND MICROSCOPE Public/Granted day:2008-06-26
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