Invention Grant
- Patent Title: Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle
- Patent Title (中): 掩模版，光学系统监视装置，光学系统监视方法及制造掩模版的方法
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Application No.: US12230269Application Date: 2008-08-27
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Publication No.: US07812972B2Publication Date: 2010-10-12
- Inventor: Takashi Sato , Masafumi Asano , Hideki Kanai
- Applicant: Takashi Sato , Masafumi Asano , Hideki Kanai
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JPP2003-199178 20030718
- Main IPC: G01B11/30
- IPC: G01B11/30 ; G01B11/24 ; G01B11/14
Abstract:
A reticle has a mask substrate, a test pattern established on the mask substrate having an asymmetrical diffraction grating so as to generate positive first order diffracting light and negative first order diffracting light in different diffraction efficiencies, and a device pattern adjacent to the test pattern established on the mask substrate.
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