Invention Grant
- Patent Title: Nitride semiconductor laser device
- Patent Title (中): 氮化物半导体激光器件
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Application No.: US12100247Application Date: 2008-04-09
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Publication No.: US07813397B2Publication Date: 2010-10-12
- Inventor: Yuji Matsuyama , Shinji Suzuki , Kousuke Ise , Atsuo Michiue , Akinori Yoneda
- Applicant: Yuji Matsuyama , Shinji Suzuki , Kousuke Ise , Atsuo Michiue , Akinori Yoneda
- Applicant Address: JP Anan-shi
- Assignee: Nichia Corporation
- Current Assignee: Nichia Corporation
- Current Assignee Address: JP Anan-shi
- Agency: Global IP Counselors, LLP
- Priority: JP2004-110019 20040402; JP2004-223755 20040730
- Main IPC: H01S5/00
- IPC: H01S5/00 ; H01L27/15

Abstract:
A nitride semiconductor laser device includes, on a first principle face of the (0001) of a nitride semiconductor substrate, a nitride semiconductor layer having a first conductivity type, an active layer, and a nitride semiconductor layer having a second conductivity type that is different from the first conductivity type, and being formed a stripe ridge on the surface thereof. The (000-1) face and an inclined face other than the (000-1) face are exposed on a second principal face of the nitride semiconductor substrate. The inclined face other than the (000-1) face represents no less than 0.5% over the surface area of the second principal face.
Public/Granted literature
- US20080192788A1 NITRIDE SEMICONDUCTOR LASER DEVICE AND NITRIDE SEMICONDUCTOR DEVICE Public/Granted day:2008-08-14
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