Invention Grant
- Patent Title: Tip array structure and fabricating method of tip structure
- Patent Title (中): 尖端阵列结构及尖端结构的制作方法
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Application No.: US11737768Application Date: 2007-04-20
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Publication No.: US07814566B2Publication Date: 2010-10-12
- Inventor: Wei-Su Chen
- Applicant: Wei-Su Chen
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Priority: TW95149449A 20061228
- Main IPC: G01Q70/16
- IPC: G01Q70/16

Abstract:
A fabricating method of a structure having nano-hole is provided. The fabricating method includes: providing a substrate, forming a photoresist layer on the substrate, forming an opening, and performing a heat treatment process on the photoresist layer to shrink the opening to form a nano-hole. The structure having nano-hole fabricated by the method of the present invention can be used to fabricate a nano-tip having a diameter of tip-body of no more than 10 nm, high aspect ratio, and a uniform diameter of tip-body.
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