Invention Grant
US07814566B2 Tip array structure and fabricating method of tip structure 有权
尖端阵列结构及尖端结构的制作方法

Tip array structure and fabricating method of tip structure
Abstract:
A fabricating method of a structure having nano-hole is provided. The fabricating method includes: providing a substrate, forming a photoresist layer on the substrate, forming an opening, and performing a heat treatment process on the photoresist layer to shrink the opening to form a nano-hole. The structure having nano-hole fabricated by the method of the present invention can be used to fabricate a nano-tip having a diameter of tip-body of no more than 10 nm, high aspect ratio, and a uniform diameter of tip-body.
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