Invention Grant
- Patent Title: Surface treatment method
- Patent Title (中): 表面处理方法
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Application No.: US11687879Application Date: 2007-03-19
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Publication No.: US07815492B2Publication Date: 2010-10-19
- Inventor: Yasuharu Sasaki , Masakazu Higuma , Tadashi Aoto , Eiichiro Kikuchi
- Applicant: Yasuharu Sasaki , Masakazu Higuma , Tadashi Aoto , Eiichiro Kikuchi
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-077266 20060320
- Main IPC: B24B1/00
- IPC: B24B1/00

Abstract:
A surface treatment method that enables a surface of an electrostatic chuck to be smoothed, so as to improve the efficiency of heat transfer between the surface of the electrostatic chuck and a substrate. The electrostatic chuck is provided in an upper portion of a susceptor provided in a chamber of a substrate processing apparatus. In the surface treatment of the electrostatic chuck, a sprayed coating film is formed on the surface of the electrostatic chuck, next the surface of the electrostatic chuck is ground by bringing into contact therewith a grindstone, then the surface of the electrostatic chuck is ground flat by bringing into contact therewith a lapping plate onto a surface of which is sprayed a suspension, and then the surface of the electrostatic chuck is ground smooth by bringing into contact therewith a tape of a tape lapping apparatus.
Public/Granted literature
- US20080280536A1 SURFACE TREATMENT METHOD Public/Granted day:2008-11-13
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