Invention Grant
- Patent Title: Black matrix for color filter and its method of manufacture
- Patent Title (中): 滤色器黑色矩阵及其制造方法
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Application No.: US11797340Application Date: 2007-05-02
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Publication No.: US07816010B2Publication Date: 2010-10-19
- Inventor: In-taek Han , Wou-sik Kim
- Applicant: In-taek Han , Wou-sik Kim
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2006-0116058 20061122
- Main IPC: B32B9/00
- IPC: B32B9/00

Abstract:
A black matrix for a color filter and its method of manufacture include: forming the black matrix in a predetermined shape on a substrate to define a plurality of pixel regions: forming a light shade layer on the substrate, the light shade layer being formed of an ink-philic black material; and forming a Carbon NanoTube (CNT) layer on an upper surface of the light shade layer.
Public/Granted literature
- US20080118739A1 Blackmatrix for color filter and its method of manufacture Public/Granted day:2008-05-22
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