Invention Grant
US07816070B2 Substrate used for immersion lithography process, method of manufacturing substrate used for immersion lithography process, and immersion lithography
有权
用于浸没式光刻工艺的基板，用于浸没式光刻工艺的基板的制造方法以及浸没式光刻技术
- Patent Title: Substrate used for immersion lithography process, method of manufacturing substrate used for immersion lithography process, and immersion lithography
- Patent Title (中): 用于浸没式光刻工艺的基板，用于浸没式光刻工艺的基板的制造方法以及浸没式光刻技术
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Application No.: US11878399Application Date: 2007-07-24
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Publication No.: US07816070B2Publication Date: 2010-10-19
- Inventor: Akifumi Kamijima
- Applicant: Akifumi Kamijima
- Applicant Address: JP Tokyo
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-210637 20060802
- Main IPC: G03F7/11
- IPC: G03F7/11
Abstract:
A substrate having a photoresist film, capable of easily performing immersion lithography with high precision and stability, is provided. A surface tension of the substrate in a periphery region is lower than that of the substrate in a rest region. Immersion liquid supplied onto the photoresist film hardly leaks out, and the bubbles hardly occur in the immersion liquid.
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Information query
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