Invention Grant
US07816480B2 Silole-based polymers and semiconductor materials prepared from the same
有权
基于Silole的聚合物和由其制备的半导体材料
- Patent Title: Silole-based polymers and semiconductor materials prepared from the same
- Patent Title (中): 基于Silole的聚合物和由其制备的半导体材料
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Application No.: US12563680Application Date: 2009-09-21
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Publication No.: US07816480B2Publication Date: 2010-10-19
- Inventor: Tobin J. Marks , Antonio Facchetti , Gang Lu , Hakan Usta , Joseph Letizia
- Applicant: Tobin J. Marks , Antonio Facchetti , Gang Lu , Hakan Usta , Joseph Letizia
- Applicant Address: US IL Evanston
- Assignee: Northwestern University
- Current Assignee: Northwestern University
- Current Assignee Address: US IL Evanston
- Agency: K&L Gates LLP
- Main IPC: C08G77/04
- IPC: C08G77/04
Abstract:
The present teachings provide silole-based polymers that can be used as p-type semiconductors. More specifically, the present teachings provide polymers that include a repeating unit of Formula I: wherein R1, R2, R3, R4, R5R6, Z, x, and x′ are as defined herein. The present teachings also provide methods of preparing these polymers, and relate to various compositions, composites, and devices that incorporate these polymers.
Public/Granted literature
- US20100024883A1 Silole-Based Polymers and Semiconductor Materials Prepared from the Same Public/Granted day:2010-02-04
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