Invention Grant
- Patent Title: BJT and method for fabricating the same
- Patent Title (中): BJT及其制造方法
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Application No.: US11930592Application Date: 2007-10-31
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Publication No.: US07816763B2Publication Date: 2010-10-19
- Inventor: Nam Joo Kim
- Applicant: Nam Joo Kim
- Applicant Address: KR Seoul
- Assignee: Dongbu Hitek Co., Ltd.
- Current Assignee: Dongbu Hitek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: KR10-2006-0134635 20061227
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
According to one embodiment, a collector electrode including metal is used for a sink region for connecting an n+ type buried layer, so that the sink region can be narrowly formed. Further, an interval between a base region and the collector electrode can be reduced, thereby considerably decreasing the size of the transistor. Furthermore, collector resistance is reduced, so that the performance of the transistor can be improved.
Public/Granted literature
- US20080157280A1 BJT AND METHOD FOR FABRICATING THE SAME Public/Granted day:2008-07-03
Information query
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