Invention Grant
- Patent Title: Exposure method and apparatus, and device producing method using two light beams to correct non-rotationally symmetric aberration
- Patent Title (中): 曝光方法和装置以及使用两个光束校正非旋转对称像差的装置制造方法
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Application No.: US11362817Application Date: 2006-02-28
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Publication No.: US07817249B2Publication Date: 2010-10-19
- Inventor: Yusaku Uehara
- Applicant: Yusaku Uehara
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2003-209211 20030828
- Main IPC: G03B27/54
- IPC: G03B27/54
Abstract:
An exposure method which includes illuminating a first object formed with a pattern to be transferred with a first light beam to expose a second object with the first light beam through the first object and a projection optical system; and irradiating the first object and at least one portion of the projection optical system with a second light beam having a wavelength range that is different from that of the first light beam to correct image forming characteristics of the projection optical system.
Public/Granted literature
- US20060244940A1 Exposure method and apparatus and device producing method Public/Granted day:2006-11-02
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