Invention Grant
US07817264B2 Method for preparing focus-adjustment data for focusing lens system of optical defect-inspection apparatus, and focus adjustment wafer used in such method
有权
光学缺陷检查装置的聚焦透镜系统的聚焦调整数据的准备方法以及用于该方法的聚焦调整用晶片
- Patent Title: Method for preparing focus-adjustment data for focusing lens system of optical defect-inspection apparatus, and focus adjustment wafer used in such method
- Patent Title (中): 光学缺陷检查装置的聚焦透镜系统的聚焦调整数据的准备方法以及用于该方法的聚焦调整用晶片
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Application No.: US11730571Application Date: 2007-04-02
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Publication No.: US07817264B2Publication Date: 2010-10-19
- Inventor: Kenichi Sanada
- Applicant: Kenichi Sanada
- Applicant Address: JP Kawasaki, Kanagawa
- Assignee: NEC Electronics Corporation
- Current Assignee: NEC Electronics Corporation
- Current Assignee Address: JP Kawasaki, Kanagawa
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2006-102564 20060403; JP2007-086589 20070329
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
In a method for preparing focus-adjustment data for a focusing lens system of an optical defect-inspection apparatus, a wafer having a plurality of defects is positioned in place with respect to a focal plane defined by the focusing lens system at a positioning step, and the detects on the wafer are optically and electronically detected at a detecting step. Then, defects having a predetermined size are extracted among the detected defects at extracting step, and a number of the extracted defects is counted as defect-number data. The positioning, detecting, extracting and counting steps are repeated whenever the focus-adjustment wafer is relatively shifted from the focal plane by a predetermined distance, and a defect-number distribution is produced based on the defect-number data thus obtained.
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