Invention Grant
US07817468B2 Semiconductor storage device provided with memory cell having charge accumulation layer and control gate
有权
设置有具有电荷累积层和控制栅极的存储单元的半导体存储装置
- Patent Title: Semiconductor storage device provided with memory cell having charge accumulation layer and control gate
- Patent Title (中): 设置有具有电荷累积层和控制栅极的存储单元的半导体存储装置
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Application No.: US12365590Application Date: 2009-02-04
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Publication No.: US07817468B2Publication Date: 2010-10-19
- Inventor: Katsuaki Isobe , Noboru Shibata
- Applicant: Katsuaki Isobe , Noboru Shibata
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-179836 20060629
- Main IPC: G11C11/34
- IPC: G11C11/34

Abstract:
A semiconductor memory device includes memory cell transistors, a first selection transistor, and word lines. Each of the memory cell transistors has a stacked gate including a charge accumulation layer and a control gate, and is configured to retain at least two levels of “0” data and “1” data according to a threshold voltage. The threshold voltage corresponding to the “0” data being the lowest threshold voltage in the levels retained by each of the memory cell transistors. The first selection transistor has a current path connected in series to one of the memory cell transistors. Each of the word lines is connected to the control gate of one of the memory cell transistors. upper limit values of threshold voltages of the memory cell transistors retaining the “0” data being different from one another in each word line.
Public/Granted literature
- US20090141553A1 SEMICONDUCTOR STORAGE DEVICE PROVIDED WITH MEMORY CELL HAVING CHARGE ACCUMULATION LAYER AND CONTROL GATE Public/Granted day:2009-06-04
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