Invention Grant
- Patent Title: Gas sensor and method of making
- Patent Title (中): 气体传感器及制作方法
-
Application No.: US11961092Application Date: 2007-12-20
-
Publication No.: US07827852B2Publication Date: 2010-11-09
- Inventor: Jun Cui , John Patrick Lemmon , Kalaga Murali Krishna , Geetha Karavoor , Vinayak Tilak , Mohandas Nayak , Ravikumar Hanumantha
- Applicant: Jun Cui , John Patrick Lemmon , Kalaga Murali Krishna , Geetha Karavoor , Vinayak Tilak , Mohandas Nayak , Ravikumar Hanumantha
- Applicant Address: US NY Niskayuna
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Niskayuna
- Agent Joseph J. Christian
- Main IPC: G01N7/10
- IPC: G01N7/10

Abstract:
A gas sensor is disclosed. The gas sensor includes a gas sensing layer including doped oxygen deficient tungsten oxide and a dopant selected from the group consisting of Re, Ni, Cr, V, W, and a combination thereof, at least one electrode positioned within a layer of titanium, and a response modification layer. The at least one electrode is in communication with the gas sensing layer and the gas sensing layer is capable of detecting at least one gas selected from the group consisting of NO, NO2, SOx O2, H2O, and NH3. A method of fabricating the gas sensor is also disclosed.
Public/Granted literature
- US20090159446A1 GAS SENSOR AND METHOD OF MAKING Public/Granted day:2009-06-25
Information query