Invention Grant
US07828016B2 Gas processing apparatus, gas processing method and integrated valve unit for gas processing apparatus
失效
气体处理设备,气体处理方法和气体处理设备的集成阀门单元
- Patent Title: Gas processing apparatus, gas processing method and integrated valve unit for gas processing apparatus
- Patent Title (中): 气体处理设备,气体处理方法和气体处理设备的集成阀门单元
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Application No.: US12081687Application Date: 2008-04-18
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Publication No.: US07828016B2Publication Date: 2010-11-09
- Inventor: Hayashi Otsuki , Yutaka Miura
- Applicant: Hayashi Otsuki , Yutaka Miura
- Applicant Address: JP Tokyo-to
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo-to
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP1999-236872 19990824
- Main IPC: F16K11/10
- IPC: F16K11/10

Abstract:
A process gas line (255) for carrying WF6 gas for nucleation, a process gas line (259) for carrying WF6 gas for film deposition after nucleation are joined at a single joint (280) to a carrier gas line (256). A gas line (270) is connected to the joint (280) to carry a mixed gas of the carrier gas and WF6 gas to a processing chamber defined by a processing vessel. Sections of the carrier gas line (256) and the gas line (270) extending on the opposite sides of the joint (280) extend along a straight line, and the process gas lines (255, 259) are perpendicular to the gas line (270).
Public/Granted literature
- US20080282977A1 Gas processing apparatus, gas processing method and integrated valve unit for gas processing apparatus Public/Granted day:2008-11-20
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