Invention Grant
- Patent Title: Free-standing silicon carbide articles formed by chemical vapor deposition and methods for their manufacture
- Patent Title (中): 通过化学气相沉积形成的独立的碳化硅制品及其制造方法
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Application No.: US10581622Application Date: 2004-12-06
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Publication No.: US07829183B2Publication Date: 2010-11-09
- Inventor: David Thomas Forrest , Mark Wallace Schauer
- Applicant: David Thomas Forrest , Mark Wallace Schauer
- Applicant Address: US CA Hayward
- Assignee: Morgan Advanced Ceramics, Inc.
- Current Assignee: Morgan Advanced Ceramics, Inc.
- Current Assignee Address: US CA Hayward
- Agency: Kilpatrick Stockton LLP
- Agent Dean W. Russell; Kristin M. Crall
- International Application: PCT/US2004/040629 WO 20041206
- International Announcement: WO2005/056873 WO 20050623
- Main IPC: B32B27/00
- IPC: B32B27/00

Abstract:
Improved methods for manufacturing silicon carbide rings using chemical vapor deposition. Cylindrical tubes are used as deposition substrates and the resulting material deposited on the inside surface of cylindrical tubes or on the outside surface of cylindrical mandrels, or both, is sliced or cut into the desired ring size and shape. The resulting rings have a crystal growth that is oriented substantially planar to the finished article. The invention also relates to nitrogen doped silicon carbide material, as well as to silicon carbide structures having axes of grain growth substantially parallel to the plane of the structure and to each other, and having rotational orientation that is substantially random with respect to the axes of grain growth of the grains.
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