Invention Grant
- Patent Title: Electrical interconnect using locally conductive adhesive
- Patent Title (中): 使用局部导电胶的电气互连
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Application No.: US11212071Application Date: 2005-08-25
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Publication No.: US07829190B2Publication Date: 2010-11-09
- Inventor: Chad A. Cobbley , Steve W. Heppler
- Applicant: Chad A. Cobbley , Steve W. Heppler
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Whyte Hirschboeck Dudek SC
- Main IPC: B32B9/00
- IPC: B32B9/00

Abstract:
An anisotropic electrically conducting interconnect is disclosed in which an adhesive comprising particles having a breakable coating of at least one electrically nonconductive material is compressed between a first contact and a second contact. Compression to two contacts breaks the breakable coating exposing an electrically conducting material which makes contact with the first and second contacts. The electrically conducting material may be a metal conductor or a two-part reactive conductive resin/catalyst system. Also disclosed are processes for making such electrical interconnects and adhesives for use in making electrical interconnect.
Public/Granted literature
- US20060003157A1 Electrical interconnect using locally conductive adhesive Public/Granted day:2006-01-05
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