Invention Grant
- Patent Title: Mask for sequential lateral solidification and method of manufacturing the same
- Patent Title (中): 连续横向固化的掩模及其制造方法
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Application No.: US11499477Application Date: 2006-08-04
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Publication No.: US07829245B2Publication Date: 2010-11-09
- Inventor: Se-jin Chung , Dong-bum Kim
- Applicant: Se-jin Chung , Dong-bum Kim
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Innovation Counsel LLP
- Priority: KR10-2005-0071414 20050804
- Main IPC: G03F1/00
- IPC: G03F1/00
Abstract:
A mask for sequential lateral solidification capable of preventing pattern deformation that may be caused by laser beam, and a method of manufacturing the same are provided. The mask includes a transparent substrate, and a heat-resistant oxide film pattern, disposed on the transparent substrate, blocking a laser beam.
Public/Granted literature
- US20070032050A1 Mask for sequential lateral solidification and method of manufacturing the same Public/Granted day:2007-02-08
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