Invention Grant
- Patent Title: Treatment of laser exposed lithographic printing plate before development
- Patent Title (中): 开发前处理激光曝光平版印刷版
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Application No.: US11967961Application Date: 2007-12-31
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Publication No.: US07829260B2Publication Date: 2010-11-09
- Inventor: Gary Ganghui Teng
- Applicant: Gary Ganghui Teng
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/26

Abstract:
A method of treating a laser exposed lithographic printing plate with a deactivating solution followed by overall irradiation is described. The plate comprises on a substrate a photosensitive layer capable of photo hardening. The deactivating solution is capable of deactivating the photo hardening capability of the photosensitive layer in the non-hardened areas so that the overall irradiation does not cause hardening of the photosensitive layer in the non-hardened areas. The deactivation and overall irradiation cause one or more chemical or physical changes to the photosensitive layer, such as further hardening of the imaged areas, improved contrast, improved developability, or improved substrate hydrophilicity. The overall irradiated plate is further developed on press with ink and/or fountain solution or off press with a developer. For off-press development, the developer may be used as the deactivating solution.
Public/Granted literature
- US20090170040A1 Treatment of laser exposed lithographic printing plate before development Public/Granted day:2009-07-02
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