Invention Grant
- Patent Title: Method for air gap formation using UV-decomposable materials
- Patent Title (中): 使用紫外分解材料形成气隙的方法
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Application No.: US11873977Application Date: 2007-10-17
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Publication No.: US07829268B2Publication Date: 2010-11-09
- Inventor: Junjun Liu , Dorel I. Toma
- Applicant: Junjun Liu , Dorel I. Toma
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/20 ; G03F7/26 ; G03F7/38 ; G03F7/40
Abstract:
A method of selectively removing a sacrificial material on a substrate is described. The method comprises forming a sacrificial layer on a substrate. Thereafter, the sacrificial layer is selectively decomposed at a temperature less than the temperature required to thermally decompose the sacrificial layer by selectively exposing the sacrificial layer to UV radiation.
Public/Granted literature
- US20090104571A1 Method for air gap formation using UV-decomposable materials Public/Granted day:2009-04-23
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