Invention Grant
- Patent Title: Image sensor and fabricating method thereof
- Patent Title (中): 图像传感器及其制造方法
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Application No.: US11933811Application Date: 2007-11-01
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Publication No.: US07829370B2Publication Date: 2010-11-09
- Inventor: Sang-Wook Ryu
- Applicant: Sang-Wook Ryu
- Applicant Address: KR Seoul
- Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Sherr & Vaughn, PLLC
- Priority: KR10-2006-0126105 20061212
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
An image sensor and fabricating method thereof which reduces a light intensity differential between a pixel center and a pixel edge and prevents crosstalk. The image sensor can include a plurality of convex lens provided within a passivation layer and in vertical alignment with a corresponding photodiode, each convex lens including a color filter; having a predetermined color array, and a plurality of microlens provided over the passivation layer and in vertical alignment with a corresponding color filer.
Public/Granted literature
- US20080135962A1 IMAGE SENSOR AND FABRICATING METHOD THEREOF Public/Granted day:2008-06-12
Information query
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