Invention Grant
- Patent Title: Fungicidal composition containing acid amide derivative
- Patent Title (中): 含有酰胺衍生物的杀真菌剂组合物
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Application No.: US11659423Application Date: 2005-08-10
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Publication No.: US07829501B2Publication Date: 2010-11-09
- Inventor: Yuji Nakamura , Shigeru Mitani , Tetsuo Yoneda
- Applicant: Yuji Nakamura , Shigeru Mitani , Tetsuo Yoneda
- Applicant Address: JP Osaka-shi
- Assignee: Ishihara Sangyo Kaisha, Ltd.
- Current Assignee: Ishihara Sangyo Kaisha, Ltd.
- Current Assignee Address: JP Osaka-shi
- Agency: Oblon, Spivak. McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2004-235634 20040812; JP2005-178614 20050617
- International Application: PCT/JP2005/014970 WO 20050810
- International Announcement: WO2006/016708 WO 20060216
- Main IPC: A01N43/10
- IPC: A01N43/10 ; C07D333/16

Abstract:
Conventional many fungicidal compositions have had practical problems such that either a preventive effect or a curing effect is inadequate, the residual effect tends to be inadequate, or the controlling effect against plant diseases tends to be inadequate depending upon the application site, and a fungicidal composition to overcome such problems has been desired. The present invention provides a fungicidal composition containing an acid amide derivative of the formula (I) or a salt thereof, as an active ingredient: wherein A is phenyl which may be substituted, benzyl which may be substituted, naphthyl which may be substituted, heterocyclic ring which may be substituted, fused heterocyclic ring which may be substituted, or the like; B is heterocyclic ring which may be substituted, fused heterocyclic ring which may be substituted, or naphthyl which may be substituted; each of R1 and R2 which are independent of each other, is alkyl, or the like; R3 is hydrogen, or the like; each of W1 and W2 which are independent of each other, is oxygen or sulfur.
Public/Granted literature
- US20080318779A1 Fungicidal Composition Containing Acid Amide Derivative Public/Granted day:2008-12-25
Information query
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