Invention Grant
- Patent Title: Avalanche photodiode
- Patent Title (中): 雪崩光电二极管
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Application No.: US12187525Application Date: 2008-08-07
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Publication No.: US07829915B2Publication Date: 2010-11-09
- Inventor: Jin-Wei Shi , Yen-Hsiang Wu
- Applicant: Jin-Wei Shi , Yen-Hsiang Wu
- Applicant Address: TW Taoyuan
- Assignee: National Central University
- Current Assignee: National Central University
- Current Assignee Address: TW Taoyuan
- Agency: Jackson IPG PLLC
- Agent Demlan K. Jackson
- Priority: TW97122954A 20080619
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
The present invention changes layer polarities of an epitaxy structure of an avalanche photodiode into n-i-n-i-p. A transport layer is deposed above an absorption layer to prevent absorbing photon and producing electrons and holes. A major part of electric field is concentrated on a multiplication layer for producing avalanche and a minor part of the electric field is left on the absorption layer for transferring carrier without avalanche. Thus, bandwidth limit from a conflict between RC bandwidth and carrier transferring time is relieved. Meanwhile, active area is enlarged and alignment error is improved without sacrificing component velocity too much.
Public/Granted literature
- US20090315073A1 Avalanche Photodiode Public/Granted day:2009-12-24
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