Invention Grant
US07829939B1 MOSFET including epitaxial halo region 有权
MOSFET包括外延晕区

MOSFET including epitaxial halo region
Abstract:
A metal oxide semiconductor field effect transistor structure and a method for fabricating the metal oxide semiconductor field effect transistor structure provide for a halo region that is physically separated from a gate dielectric. The structure and the method also provide for a halo region aperture formed horizontally and crystallographically specifically within a channel region pedestal within the metal oxide semiconductor field effect transistor structure. The halo region aperture is filled with a halo region formed using an epitaxial method, thus the halo region may be formed physically separated from the gate dielectric. As a result, performance of the metal oxide semiconductor field effect transistor is enhanced.
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