Invention Grant
- Patent Title: MOSFET including epitaxial halo region
- Patent Title (中): MOSFET包括外延晕区
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Application No.: US12426467Application Date: 2009-04-20
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Publication No.: US07829939B1Publication Date: 2010-11-09
- Inventor: Huilong Zhu , Qingqing Liang , Jing Wang
- Applicant: Huilong Zhu , Qingqing Liang , Jing Wang
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent H. Daniel Schnurmann
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94 ; H01L31/062 ; H01L31/113 ; H01L31/119

Abstract:
A metal oxide semiconductor field effect transistor structure and a method for fabricating the metal oxide semiconductor field effect transistor structure provide for a halo region that is physically separated from a gate dielectric. The structure and the method also provide for a halo region aperture formed horizontally and crystallographically specifically within a channel region pedestal within the metal oxide semiconductor field effect transistor structure. The halo region aperture is filled with a halo region formed using an epitaxial method, thus the halo region may be formed physically separated from the gate dielectric. As a result, performance of the metal oxide semiconductor field effect transistor is enhanced.
Public/Granted literature
- US20100264469A1 MOSFET INCLUDING EPITAXIAL HALO REGION Public/Granted day:2010-10-21
Information query
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