Invention Grant
- Patent Title: High-voltage vertical transistor with a multi-layered extended drain structure
- Patent Title (中): 具有多层延伸漏极结构的高压立式晶体管
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Application No.: US10929590Application Date: 2004-08-30
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Publication No.: US07829944B2Publication Date: 2010-11-09
- Inventor: Donald Ray Disney
- Applicant: Donald Ray Disney
- Applicant Address: US CA San Jose
- Assignee: Power Integrations, Inc.
- Current Assignee: Power Integrations, Inc.
- Current Assignee Address: US CA San Jose
- Agency: The Law Offices of Bradley J. Bereznak
- Main IPC: H01L29/78
- IPC: H01L29/78

Abstract:
A high-voltage transistor with a low specific on-state resistance and that supports high voltage in the off-state includes one or more source regions disposed adjacent to a multi-layered extended drain structure which comprises extended drift regions separated from field plate members by one or more dielectric layers. With the field plate members at the lowest circuit potential, the transistor supports high voltages applied to the drain in the off-state. The layered structure may be fabricated in a variety of orientations. A MOSFET structure may be incorporated into the device adjacent to the source region, or, alternatively, the MOSFET structure may be omitted to produce a high-voltage transistor structure having a stand-alone drift region.
Public/Granted literature
- US20050023571A1 High-voltage vertical transistor with a multi-layered extended drain structure Public/Granted day:2005-02-03
Information query
IPC分类: