Invention Grant
- Patent Title: Nonvolatile semiconductor memory
- Patent Title (中): 非易失性半导体存储器
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Application No.: US11963046Application Date: 2007-12-21
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Publication No.: US07829948B2Publication Date: 2010-11-09
- Inventor: Fumitaka Arai , Ichiro Mizushima , Makoto Mizukami
- Applicant: Fumitaka Arai , Ichiro Mizushima , Makoto Mizukami
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-346501 20061222
- Main IPC: H01L27/11
- IPC: H01L27/11

Abstract:
A nonvolatile semiconductor memory according to an aspect of the invention comprises a semiconductor substrate which has an SOI region and an epitaxial region at its surface, a buried oxide film arranged on the semiconductor substrate in the SOI region, an SOI layer arranged on the buried oxide film, a plurality of memory cells arranged on the SOI layer, an epitaxial layer arranged in the epitaxial region, and a select gate transistor arranged on the epitaxial layer, wherein the SOI layer is made of a microcrystalline layer.
Public/Granted literature
- US20080157092A1 NONVOLATILE SEMICONDUCTOR MEMORY Public/Granted day:2008-07-03
Information query
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